CHINA-ANHUI-INT'L RESEARCH TEAM-DAMAGE-FREE ETCHING TECHNIQUE-OPTOELECTRONIC SEMICONDUCTORS (CN)

Xinhua
15 Jan 2026, 18:46 GMT+10

(260115) -- HEFEI, Jan. 15, 2026 (Xinhua) -- Zhang Shuchen (1st L), a member of an international research team, is pictured at a lab at the University of Science and Technology of China in Hefei, east China's Anhui Province, Jan. 14, 2026.

An international research team has developed a "self-etching" technique to process soft and unstable ionic crystal lattice semiconductors, specifically 2D perovskite thin-layer single crystals, without damaging their structure, thereby overcoming a key challenge in the field of optoelectronic materials.

The study, led by researchers from the University of Science and Technology of China, Purdue University and ShanghaiTech University, was published on Thursday in the journal Nature.

TO GO WITH "Int'l research team develops damage-free etching technique for optoelectronic semiconductors" (University of Science and Technology of China/Handout via Xinhua)

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